SUNNYVALE, Calif., April 7 /CNW/ -- Fujitsu Microelectronics America,
Inc. (FMA) today published a new white paper entitled "The PSP Model in RF
CMOS Design." The white paper describes the Penn State Philips (PSP)
transistor model in RFIC design and how it can be successfully integrated into
a Process Design Kit with valuable support tools.
The white paper discusses how the surface potential approach underlying
the PSP transistor model closely describes the device physics of transistors,
providing the most accurate modeling technique for RF design. The PSP model
theory and the practical details an RF designer must consider in applying it
are discussed. The white paper also identifies the fundamental characteristics
of an effective Process Design Kit, such as the inclusion of effective
statistical and inductance tools.
"Accurately predicting circuit performance and design margins is critical
in RF design," said David Fung, director of strategic marketing, Semiconductor
Manufacturing Services business group at Fujitsu Microelectronics. "This
technical white paper is a good primer on PSP modeling for RF designers
seeking improved performance and efficiency when working with silicon
For a copy of the technology white paper, visit
About Fujitsu Microelectronics America, Inc.
Fujitsu Microelectronics America, Inc. (FMA) leads the industry in
innovation. FMA provides high-quality, reliable semiconductor products, design
and manufacturing services for the wireless, consumer, automotive, and other
markets throughout North and South America. For product information, visit the
company web site at http://us.fujitsu.com/micro/wafer or address e-mail to
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For further information: Emi Igarashi of Fujitsu Microelectronics
America, Inc., +1-408-737-5647, email@example.com; or Dick Davies of
IPRA, +1-415-652-7515, firstname.lastname@example.org, for Fujitsu Microelectronics
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